DocumentCode :
161718
Title :
Accurate RRAM transient currents during forming
Author :
Shrestha, P. ; Nminibapiel, D. ; Campbell, J.P. ; Kim, Jung-Ho ; Vaz, C. ; Cheung, K.P. ; Baumgart, Helmut
Author_Institution :
Semicond. & Dimensional Metrol. Div., NIST, Gaithersburg, MD, USA
fYear :
2014
fDate :
28-30 April 2014
Firstpage :
1
Lastpage :
2
Abstract :
The magnitude of overshoot current during forming has been shown to be a serious issue. Recently we showed that the overshoot duration is equally important in impacting device performance. Shorter duration overshoot in the range of ns yields better performance, suggesting extremely short forming pulse to be desirable. But investigation of such short forming transients is severely limited experimentally due to parasitic. In this study we demonstrate a technique to accurately de-embed these parasitic components yielding accurate forming current transients in the ps range, paving the road to careful study of the forming process.
Keywords :
forming processes; random-access storage; transient analysis; RRAM transient currents; forming current transients; forming process; overshoot current magnitude; overshoot duration; parasitic components; Capacitance; Current measurement; Hafnium compounds; Performance evaluation; Reliability; Time measurement; Tin; RRAM; current overshoot; forming; transient current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems and Application (VLSI-TSA), Proceedings of Technical Program - 2014 International Symposium on
Conference_Location :
Hsinchu
Type :
conf
DOI :
10.1109/VLSI-TSA.2014.6839688
Filename :
6839688
Link To Document :
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