• DocumentCode
    161718
  • Title

    Accurate RRAM transient currents during forming

  • Author

    Shrestha, P. ; Nminibapiel, D. ; Campbell, J.P. ; Kim, Jung-Ho ; Vaz, C. ; Cheung, K.P. ; Baumgart, Helmut

  • Author_Institution
    Semicond. & Dimensional Metrol. Div., NIST, Gaithersburg, MD, USA
  • fYear
    2014
  • fDate
    28-30 April 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The magnitude of overshoot current during forming has been shown to be a serious issue. Recently we showed that the overshoot duration is equally important in impacting device performance. Shorter duration overshoot in the range of ns yields better performance, suggesting extremely short forming pulse to be desirable. But investigation of such short forming transients is severely limited experimentally due to parasitic. In this study we demonstrate a technique to accurately de-embed these parasitic components yielding accurate forming current transients in the ps range, paving the road to careful study of the forming process.
  • Keywords
    forming processes; random-access storage; transient analysis; RRAM transient currents; forming current transients; forming process; overshoot current magnitude; overshoot duration; parasitic components; Capacitance; Current measurement; Hafnium compounds; Performance evaluation; Reliability; Time measurement; Tin; RRAM; current overshoot; forming; transient current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems and Application (VLSI-TSA), Proceedings of Technical Program - 2014 International Symposium on
  • Conference_Location
    Hsinchu
  • Type

    conf

  • DOI
    10.1109/VLSI-TSA.2014.6839688
  • Filename
    6839688