Title :
A methodology for evaluating the area of contacts to improve the accuracy of contact resistance measurements
Author :
Walton, A.J. ; Fallon, M. ; Stevenson, J.T. ; Ross, A. ; Holwill, R.J.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
The contact area is an important parameter in the measurement of specific sheet resistivity. The authors propose models which can be used to represent the area of contact together with the measurements that are required for the calculation of contact area. Particular attention is given to optical measurements, SEM (scanning electron microscope), and Vernier-type measurements
Keywords :
contact resistance; electric resistance measurement; measurement by laser beam; scanning electron microscopy; SEM; Vernier-type measurements; contact area; contact resistance measurements; optical measurements; specific sheet resistivity; Area measurement; Computational geometry; Conductivity; Contact resistance; Electric variables measurement; Electrical resistance measurement; Integrated circuit measurements; Kelvin; Semiconductor device modeling; Shape;
Conference_Titel :
Microelectronic Test Structures, 1991. ICMTS 1991. Proceedings of the 1991 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-87942-588-1
DOI :
10.1109/ICMTS.1990.161707
