Title :
Evaluating electrostatic damage prevention methods for full-scale reticle manufacturing
Author :
Turley, Christina ; Kindt, Louis ; Kinnear, John
Author_Institution :
IBM Corp., Essex Junction, VT, USA
Abstract :
Discovery of Electric Field Induced Migration (EFM) below the control limits of Electrostatic Discharge (ESD) prevention has raised concerns in photomask manufacturing. We evaluated the control system by focusing on handling and processing. Using an in-situ monitoring device in combination with an ESD test reticle, we evaluated what infrastructure was necessary to accommodate new electrostatic concerns.
Keywords :
electrostatic discharge; reticles; ESD; electric field induced migration; electrostatic damage prevention method; electrostatic discharge prevention; full scale reticle manufacturing; in-situ monitoring device; photomask manufacturing; Electric fields; Electrostatic discharges; Electrostatics; Manufacturing; Monitoring; Resistance; Standards; EFM; ESD; Reticle damage; electrostatic damage;
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2013 35th
Conference_Location :
Las Vegas, NV
