Lithographic Data Generation Algorithm based on Micromirror Cell Decomposition

In maskless lithography, micromirrors in an array work like a mask to write patterns directly onto substrates. We focus our attention on lithographic data generation for digital micromirror device (DMD) based maskless lithography on a huge substrate, with no manipulation of the light source shape, with no adjustment of mirror tilting angles, and/or without grey imaging levels. To overcome the limitations of existing lithographic data generation methods developed upon the assessment of lithographic paths of the reflected beam spots, we place our primary concern on the pattern. To generate lithographic data for controlling the on/off reflection of millions of micromirrors, we devise a unique criterion, the occupancy limit. By comparing the actual occupancy of the pattern per unit micromirror to the occupancy limit, which is a value determined upon the lithography process condition by the user, binary reflections off micromirrors are approved. A strategy for the computation of the actual occupancy of the pattern per unit micromirror is devised upon the micromirror cell decomposition (MCD). The MCD algorithm for lithographic data generation is proposed. For verification, along with a lithography simulation, an actual lithography experiment is performed to fabricate a pattern on a wafer