• DocumentCode
    1623455
  • Title

    Self-aligned inkjet printing of TFTs/circuits

  • Author

    Roy, Sandip ; Shunpu Li

  • Author_Institution
    Microsyst. Center, Univ. Coll. Cork, Cork, Ireland
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We have demonstrated a novel process to fabricate solution-processable TFTs with a one-step, self-aligned definition of the dimensions in all functional layers. The TFT-channel, semiconductor materials, and gate dimension of different layers are all determined by one-step imprint process and the subsequent pattern transfer without the need for multiple patterning and mask alignment. In addition, all the techniques used here, i.e., imprinting, wet/dry etching, and inkjet printing, are available in roll-to-roll processes. The demonstrated high-resolution features, mask alignment free process, and compatibility to roll-to-roll fabrication show that this technique is ready to use and has the advantage of low cost.
  • Keywords
    etching; ink jet printing; semiconductor materials; thin film transistors; TFT-channel; gate dimension; mask alignment free process; roll-to-roll processes; self-aligned inkjet printing; semiconductor materials; thin film transistors; wet-dry etching; Electrodes; Fabrication; Logic gates; Polymers; Printing; Resists; Thin film transistors; imprinting; inkjet printing; polymer transistor; self-alignment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Emerging Electronics (ICEE), 2012 International Conference on
  • Conference_Location
    Mumbai
  • Print_ISBN
    978-1-4673-3135-7
  • Type

    conf

  • DOI
    10.1109/ICEmElec.2012.6636224
  • Filename
    6636224