• DocumentCode
    1623979
  • Title

    Characterization and Modeling of Miniature Microwave Discharges Used for Materials Processing

  • Author

    Narendra, J.J. ; Zhang, J. ; Grotjohn, T.A. ; Xi, N. ; Asmussen, J.

  • Author_Institution
    Michigan State Univ., East Lansing
  • fYear
    2007
  • Firstpage
    565
  • Lastpage
    565
  • Abstract
    Summary form only given. This paper measures the plasma density and plasma gas temperature experimentally using Langmuir probe and optical emission spectroscopy techniques. The operating pressures range from 1 Torr to 100´s Torr. The microwave powers utilized range from a few Watts to 100 Watts. The plasma discharge in the tube discharge region is modeled using both a global model and a surface wave discharge model. The flow of the plasma discharge/beam from the source, through the aperture and down to the substrate surface is also modeled. The modeling results will be compared to experimental data showing the size and shape of the region processed by the plasma discharge/beam.
  • Keywords
    high-frequency discharges; plasma density; plasma flow; plasma materials processing; Langmuir probe; materials processing; microwave powers; miniature microwave discharges; optical emission spectroscopy techniques; plasma density; plasma discharge flow; plasma gas temperature; surface wave discharge; Fault location; Materials processing; Optical surface waves; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Plasma temperature; Plasma waves; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
  • Conference_Location
    Albuquerque, NM
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-0915-0
  • Type

    conf

  • DOI
    10.1109/PPPS.2007.4345871
  • Filename
    4345871