DocumentCode
1623979
Title
Characterization and Modeling of Miniature Microwave Discharges Used for Materials Processing
Author
Narendra, J.J. ; Zhang, J. ; Grotjohn, T.A. ; Xi, N. ; Asmussen, J.
Author_Institution
Michigan State Univ., East Lansing
fYear
2007
Firstpage
565
Lastpage
565
Abstract
Summary form only given. This paper measures the plasma density and plasma gas temperature experimentally using Langmuir probe and optical emission spectroscopy techniques. The operating pressures range from 1 Torr to 100´s Torr. The microwave powers utilized range from a few Watts to 100 Watts. The plasma discharge in the tube discharge region is modeled using both a global model and a surface wave discharge model. The flow of the plasma discharge/beam from the source, through the aperture and down to the substrate surface is also modeled. The modeling results will be compared to experimental data showing the size and shape of the region processed by the plasma discharge/beam.
Keywords
high-frequency discharges; plasma density; plasma flow; plasma materials processing; Langmuir probe; materials processing; microwave powers; miniature microwave discharges; optical emission spectroscopy techniques; plasma density; plasma discharge flow; plasma gas temperature; surface wave discharge; Fault location; Materials processing; Optical surface waves; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Plasma temperature; Plasma waves; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
Conference_Location
Albuquerque, NM
ISSN
0730-9244
Print_ISBN
978-1-4244-0915-0
Type
conf
DOI
10.1109/PPPS.2007.4345871
Filename
4345871
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