DocumentCode :
1624038
Title :
Effects of Initial Plasma Properties on Plasma Recovery in Plasma Source Ion Implantation
Author :
Chung, K.J. ; Jung, S.W. ; Choe, J.M. ; Kim, G.H. ; Hwang, Y.S.
Author_Institution :
Seoul Nat. Univ., Seoul
fYear :
2007
Firstpage :
569
Lastpage :
569
Abstract :
Summary form only given. An expanded plasma sheath in front of a negatively biased target immersed in low-pressure plasmas recovers to its initial state after turning off the negative bias. This recovery process has been assumed to be governed by the ambipolar diffusion model (Wood, 1993) or Bohm sheath collapse model (En et al., 1995). However, the detailed explanations for plasma recovery process are still unsatisfactory since those models are based on the unrealistic assumption of a step-like density profile at sheath edge. We investigated the plasma recovery process occurring during the pulse-off time both experimentally and numerically. Experiments were carried out with low-pressure argon plasmas generated by an rf inductive heating in the cylindrical quartz vacuum chamber. The dynamic motion of plasma sheath and the propagation of rarefaction wave into the plasma during and after the pulse bias were measured with a positively-biased electrostatic probe. Also, initial plasma properties such as plasma density, electron temperature, and ion flow velocity were measured using various probe methods. For the numerical consideration, an equivalent circuit model was developed to model the pulse system used in the experiment. In the circuit model, the response of plasma sheath was calculated using one-dimensional two-fluid model and inserted into the circuit model as a load element of the entire pulse system. From the experimental and numerical results, it was found that initial plasma properties in front of a target were important in plasma recovery process. Especially, the initial ion flow velocity always existing around an object immersed in plasmas by a formation of presheath or a diffusion of bulk plasma was found to play a crucial role for plasma recovery in low-pressure plasmas. These results indicate that a complete set of initial plasma properties should be considered in the model to describe plasma recovery process properly.
Keywords :
plasma density; plasma electrostatic waves; plasma flow; plasma immersion ion implantation; plasma pressure; plasma probes; plasma radiofrequency heating; plasma sheaths; plasma temperature; plasma transport processes; Bohm sheath collapse model; ambipolar diffusion model; cylindrical quartz vacuum chamber; dynamic motion; electron temperature; equivalent circuit model; expanded plasma sheath; immersed negatively biased target; ion flow velocity; low-pressure argon plasmas; one-dimensional two-fluid model; plasma propagation; plasma recovery; plasma source ion implantation; positively-biased electrostatic probe; pulse system; rarefaction wave; rf inductive heating; step-like plasma density profile; Ion implantation; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma properties; Plasma sheaths; Plasma sources; Plasma temperature; Plasma waves; Pulse measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
Conference_Location :
Albuquerque, NM
ISSN :
0730-9244
Print_ISBN :
978-1-4244-0915-0
Type :
conf
DOI :
10.1109/PPPS.2007.4345875
Filename :
4345875
Link To Document :
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