DocumentCode :
162436
Title :
Application-based review of GaN HFETs
Author :
Jones, Edward A. ; Wang, F. ; Ozpineci, Burak
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA
fYear :
2014
fDate :
13-15 Oct. 2014
Firstpage :
24
Lastpage :
29
Abstract :
Normally-off GaN-on-Si heterojunction field-effect transistors (HFETs) have been developed with up to 650 V blocking capability, fast switching, and low conduction losses in commercial devices. The natively depletion-mode device can be modified to be normally-off using a variety of techniques. For a power electronics engineer accustomed to Si-based converter design, there is inherent benefit to understanding the unique characteristics and challenges that distinguish GaN HFETs from Si MOSFETs. Dynamic Rds-on self-commutated reverse conduction, gate voltage and current requirements, and the effects of very fast switching are explained from an applications perspective. This paper reviews available literature on commercial and near-commercial GaN HFETs, to prepare engineers with Si-based power electronics experience to effectively design GaN-based converters.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; wide band gap semiconductors; GaN; GaN HFETs; blocking capability; depletion-mode device; fast switching; heterojunction field-effect transistors; low conduction losses; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Silicon; Threshold voltage; GaN Gallium Nitride; HEMT; HFET;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wide Bandgap Power Devices and Applications (WiPDA), 2014 IEEE Workshop on
Conference_Location :
Knoxville, TN
Type :
conf
DOI :
10.1109/WiPDA.2014.6964617
Filename :
6964617
Link To Document :
بازگشت