Title :
Radial analysis of a C/sub 2/F/sub 6/ inductively coupled plasma using optical emission spectroscopy and laser induced fluorescence
Author :
Shannon, Steven ; Hebner, G. ; Holloway, James P. ; Brake, Mary L.
Author_Institution :
Dept. of Nucl. Eng. & Radiol. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
Summary form only given, as follows. A C/sub 2/F/sub 6/ discharge in a GEC rf reference cell equipped with an inductively coupled source has been analyzed using laser induced fluorescence and spatially resolved optical emission spectroscopy. Experiments were conducted approximately 1 cm above the lower electrode for C/sub 2/F/sub 6/ and C/sub 2/F/sub 6//Ar discharges at pressures ranging from 5 mTorr to 20 mTorr and inductive electrode power ranging from 100 W to 300 W. A 30 W bias was placed on the bottom electrode for all experiments. A 6 inch bare silicon wafer was used to represent processing conditions. A quartz ring was clamped to the top electrode to provide discharge stability. Radial profiles of optical emission were obtained using a novel glow discharge tomography sensor and regularized inversion solver. The 488 nm SiF line and the 703 nm F line were profiled, as well as the 750.4 nm Ar line in the C/sub 2/F/sub 6//Ar runs in order to conduct spatially resolved actinometry of fluorine. Spatially resolved ground state radical density profiles were measured by laser induced fluorescence.
Keywords :
organic compounds; 100 to 300 W; 30 W; 488 nm; 5 to 20 mtorr; 703 nm; 750.4 nm; Ar line; F line; GEC RF reference cell; SiF line; bare Si wafer; discharge stability; glow discharge tomography sensor; hexafluoroethane; inductively coupled plasma; laser induced fluorescence; optical emission; optical emission spectroscopy; quartz ring; radial analysis; regularized inversion solver; spatially resolved actinometry; spatially resolved ground state radical density profiles; Argon; Electrodes; Fault location; Fluorescence; Optical coupling; Optical sensors; Silicon; Spatial resolution; Spectroscopy; Stimulated emission;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677626