DocumentCode
1624893
Title
Pulsed laser deposition of half-metallic CrO2 thin films for spintronic applications
Author
Dwivedi, Shipra ; Biswas, Santosh
Author_Institution
LNM Inst. of Inf. Technol., Jaipur, India
fYear
2012
Firstpage
1
Lastpage
4
Abstract
Granular thin films of half-metallic CrO2 have been deposited by pulsed laser deposition technique using Cr2O3 target. The deposited films have been characterized by XRD, FTIR, SEM, AFM and spectroscopic ellipsometry.
Keywords
Fourier transform spectra; X-ray diffraction; atomic force microscopy; chromium compounds; ellipsometry; infrared spectra; pulsed laser deposition; scanning electron microscopy; thin films; AFM; CrO2; FTlR; SEM; XRD; granular thin films; half-metallic thin films; pulsed laser deposition; spectroscopic ellipsometry; spintronics; Ellipsometry; Laser modes; Magnetic tunneling; Nanoscale devices; Oxygen; Pulsed laser deposition; Shape; Half-metals; chromium di-oxide (CrO2 ); pulsed laser deposition; spintronics;
fLanguage
English
Publisher
ieee
Conference_Titel
Emerging Electronics (ICEE), 2012 International Conference on
Conference_Location
Mumbai
Print_ISBN
978-1-4673-3135-7
Type
conf
DOI
10.1109/ICEmElec.2012.6636271
Filename
6636271
Link To Document