• DocumentCode
    1625176
  • Title

    Influence of Substrate Surface Roughness on Tin Whisker Growth

  • Author

    Rodekohr, C.L. ; Flowers, G.T. ; Suhling, J.C. ; Bozack, M.J.

  • Author_Institution
    Center for Adv. Vehicle Electron., Auburn Univ., Auburn, AL
  • fYear
    2008
  • Firstpage
    245
  • Lastpage
    248
  • Abstract
    Implementation of Pb-free electronics has resulted in use of pure Sn surface finishes which are known to pose reliability issues due to the spontaneous growth of Sn whiskers. In this study, atomic force microscopy (AFM) has been used to investigate the effect of surface roughness on Sn whisker growth. The varying (brass) substrate roughness conditions have been created by an unpolished, an electrochemically-polished, and a mechanically-polished surface. Subsequent Sn deposition using magnetron sputtering produced a thin (~6000 Aring) Sn film on the brass. Results show that the smoother brass substrates produced significantly more Sn whiskers than rougher surfaces. Both the quantity of whiskers is greater and the average whisker length is longer as the brass smoothness increases. This is contrary to conventional wisdom which presumed that rougher surfaces offered more film stress and enhanced whisker growth.
  • Keywords
    atomic force microscopy; sputtering; surface roughness; whiskers (crystal); atomic force microscopy; magnetron sputtering; substrate surface roughness; tin whisker growth; Atomic force microscopy; Compressive stress; Electronics packaging; Lead; Legislation; Rough surfaces; Sputtering; Substrates; Surface roughness; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Contacts, 2008. Proceedings of the 54th IEEE Holm Conference on
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    978-1-4244-1901-2
  • Electronic_ISBN
    978-1-4244-1902-9
  • Type

    conf

  • DOI
    10.1109/HOLM.2008.ECP.51
  • Filename
    4694952