DocumentCode :
1625356
Title :
Numerical simulation of plasma immersion ion implantation of a finite-length cylindrical bore with auxiliary electrode by two-dimensional fluid model
Author :
Kwok, T.K. ; Sheridan, T.E. ; Zeng, X.C. ; Chu, P.K.
Author_Institution :
Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, Hong Kong
fYear :
1998
Firstpage :
176
Abstract :
Summary form only given. Plasma immersion ion implantation (PIII) of the interior surface of an infinite length cylindrical bore with an auxiliary electrode has been studied in some detail. The geometry considered so far is one dimensional with all variables as functions of the radial direction in cylindrical coordinates. If we consider a cylindrical bore with finite length, then the PIII process becomes a two-dimensional case that is a totally different class of problem. All the variables will depend on the radial and longitudinal directions in cylindrical coordinate. In this article, plasma immersion ion implantation (PIII) of the inner surface of a finite length cylindrical bore with a coaxial, grounded auxiliary electrode is modeled using a two-dimensional fluid simulation. A thin ring shape cylindrical bore is used in our simulation. It is found that the sheath structure resulting from the auxiliary electrode focuses ions from both inside and outside the bore onto the inner surface. To provide uniform implantation of the inner surface, it is recommended that the implantation process ends after the initial charge of ions is emptied from the bore.
Keywords :
electrodes; ion implantation; plasma applications; plasma simulation; auxiliary electrode; coaxial grounded auxiliary electrode; cylindrical coordinate; cylindrical coordinates; finite-length cylindrical bore; infinite length cylindrical bore; initial charge; interior surface; longitudinal directions; numerical simulation; one dimensional geometry; plasma immersion ion implantation; radial direction; radial directions; thin ring shape cylindrical bore; two-dimensional fluid model; two-dimensional fluid simulation; uniform implantation; Boring; Dusty plasma; Electrodes; Glow discharges; Kinetic theory; Numerical simulation; Physics; Plasma immersion ion implantation; Plasma materials processing; Plasma simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677638
Filename :
677638
Link To Document :
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