Title :
Ultra-low-loss silicon based spot-size converter fabricated by CMOS compatible process
Author :
Takei, Ryohei ; Suzuki, Masao ; Omoda, Emiko ; Manako, Shoko ; Kamei, Toshihiro ; Mori, Masahiko ; Sakakibara, Youichi
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
Abstract :
An ultra-low-loss silicon based spot-size converter with an ultimate inverse-tapered waveguide was fabricated using a double-patterning photolithography technique. The measured mode conversion losses were 0.35±0.05 and 0.21±0.01 dB for the TE- and TM-like modes, respectively.
Keywords :
CMOS integrated circuits; integrated optoelectronics; optical fabrication; optical losses; optical waveguides; optical wavelength conversion; photolithography; silicon-on-insulator; CMOS compatible process; Si; TE-like modes; TM-like modes; double-patterning photolithography; mode conversion losses; spot-size converter; ultimate inverse-tapered waveguide; ultralow-loss silicon; Couplings; Lithography; Optical fiber devices; Optical fibers; Silicon; Wires; double-patterning technique; inverse taper waveguide; photolithography; silicon photonics; spot-size converter;
Conference_Titel :
Group IV Photonics (GFP), 2012 IEEE 9th International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4577-0826-8
DOI :
10.1109/GROUP4.2012.6324078
