DocumentCode :
1626250
Title :
High efficiency grating couplers based on CMOS poly-silicon gate layer
Author :
Qiu, Chao ; Sheng, Zhen ; Li, Le ; Pang, Albert ; Wu, Aimin ; Wang, Xi ; Gan, Fuwan ; Zou, Shichang
Author_Institution :
State Key Lab. of Functional Mater. for Inf., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
fYear :
2012
Firstpage :
90
Lastpage :
92
Abstract :
Grating couplers using CMOS poly-silicon gate layer are demonstrated, which can be integrated with electronic circuits without adding any additional process steps. Peak coupling efficiency of ~40% and 3dB bandwidth of ~60nm are obtained with low back reflection.
Keywords :
CMOS integrated circuits; diffraction gratings; integrated optoelectronics; light reflection; optical couplers; silicon-on-insulator; CMOS polysilicon gate layer; Si; back reflection; coupling efficiency; high efficiency grating couplers; integrated electronic circuits; CMOS integrated circuits; Couplers; Couplings; Gratings; Logic gates; MOSFETs; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2012 IEEE 9th International Conference on
Conference_Location :
San Diego, CA
ISSN :
1949-2081
Print_ISBN :
978-1-4577-0826-8
Type :
conf
DOI :
10.1109/GROUP4.2012.6324096
Filename :
6324096
Link To Document :
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