• DocumentCode
    162733
  • Title

    Surface polishing and slope cut by parallel ar ion beams for high resolution electron backscatter diffraction measurements

  • Author

    Radi, Zs ; Havancsak, K. ; Kalacska, Sz ; Baris, A.

  • Author_Institution
    Technoorg-Linda Ltd., Budapest, Hungary
  • fYear
    2014
  • fDate
    2-6 Feb. 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    For the large majority of materials science studies a good quality surface is extremely important. Especially, it is of great importance in case of electron backscatter diffraction (EBSD) where the information depth is as shallow as some tens of nanometres and this is the reason why this analytical method requires a damage- and oxide-free sample surface. The SC-1000 SEMPrep dual Ar ion beam workstation developed by Technoorg Linda Ltd., Hungary, is suitable for both surface polishing and slope cutting of solid state samples, preparing high-quality surfaces. These surfaces allow several types of SEM investigations including the surface sensitive EBSD analysis. The present paper demonstrates the operating principle of the SC-1000 SEMPrep apparatus and its outstanding abilities. Here we present Ar ion polishing of different conductive and nonconductive materials followed by high-resolution EBSD measurements. The average image quality (IQ) number of the Kikuchi patterns has been studied as a function of polishing angle and time in order to find the optimal polishing conditions. It has also been shown that using the optimal operation parameters high-quality surfaces can be obtained on different metallic and non-metallic materials.
  • Keywords
    argon; cutting; electron backscattering; electron diffraction crystallography; polishing; scanning electron microscopy; surface structure; Ar ion polishing; EBSD; Hungary; Kikuchi patterns; SC-1000 SEMPrep apparatus; SC-1000 SEMPrep dual Ar ion beam workstation; Technoorg Linda Ltd; damage-sample surface; high resolution electron backscatter diffraction; image quality number; information depth; nonconductive materials; nonmetallic materials; optimal operation parameters; optimal polishing conditions; oxide-free sample surface; parallel Ar ion beams; polishing angle; scanning electron microscopy; slope cutting; surface polishing; Ion beams; Materials; Milling; Scanning electron microscopy; Surface cleaning; Surface morphology; electron backscatter diffraction; sample preparation; scanning electron microscopy; slope cutting; surface polishing; surface quality;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoscience and Nanotechnology (ICONN), 2014 International Conference on
  • Conference_Location
    Adelaide, SA
  • Type

    conf

  • DOI
    10.1109/ICONN.2014.6965245
  • Filename
    6965245