DocumentCode
1627335
Title
Breakdown voltage enhancement in lateral AlGaN/GaN heterojunction FETs with multiple field plates
Author
Andrei, Petru
Author_Institution
Dept. of Electr. & Comput. Eng., Florida State Univ., Tallahassee, FL, USA
fYear
2010
Firstpage
1344
Lastpage
1346
Abstract
It has been proposed in the literature to use metal field plates (FPs) in order to increase the breakdown voltage (BV) of AlGaN/GaN HEMTs. In this article we analyze the possibility of using multiple FPs to increase the gate-to-drain BV. We show that FPs with variable oxide thickness (with thinner oxide towards the gate electrode and thicker oxide thickness towards the drain electrode) increase the BV more efficiently than a single FP. FPs with variable oxide thickness can be built using multiple FPs with increasing oxide thickness from gate to drain and, when all FPs are connected to the source electrode.
Keywords
aluminium compounds; gallium compounds; high electron mobility transistors; AlGaN-GaN; HEMT; breakdown voltage enhancement; drain electrode; gate electrode; gate-to-drain breakdown voltage; heterojunction field-effect transistors; lateral heterojunction FET; metal field plates; source electrode; variable oxide thickness; Aluminum gallium nitride; Electric fields; Electrodes; Gallium nitride; HEMTs; Logic gates; MODFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667275
Filename
5667275
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