• DocumentCode
    1627335
  • Title

    Breakdown voltage enhancement in lateral AlGaN/GaN heterojunction FETs with multiple field plates

  • Author

    Andrei, Petru

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Florida State Univ., Tallahassee, FL, USA
  • fYear
    2010
  • Firstpage
    1344
  • Lastpage
    1346
  • Abstract
    It has been proposed in the literature to use metal field plates (FPs) in order to increase the breakdown voltage (BV) of AlGaN/GaN HEMTs. In this article we analyze the possibility of using multiple FPs to increase the gate-to-drain BV. We show that FPs with variable oxide thickness (with thinner oxide towards the gate electrode and thicker oxide thickness towards the drain electrode) increase the BV more efficiently than a single FP. FPs with variable oxide thickness can be built using multiple FPs with increasing oxide thickness from gate to drain and, when all FPs are connected to the source electrode.
  • Keywords
    aluminium compounds; gallium compounds; high electron mobility transistors; AlGaN-GaN; HEMT; breakdown voltage enhancement; drain electrode; gate electrode; gate-to-drain breakdown voltage; heterojunction field-effect transistors; lateral heterojunction FET; metal field plates; source electrode; variable oxide thickness; Aluminum gallium nitride; Electric fields; Electrodes; Gallium nitride; HEMTs; Logic gates; MODFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667275
  • Filename
    5667275