Title :
Gas cluster ion beam treatment for silicon waveguide trimming
Author :
Cai, Jingnan ; Sumie, Kensuke ; Toyoda, Noriaki ; Ishikawa, Yasuhiko ; Wada, Kazumi
Author_Institution :
Dept. of Mater. Eng., Univ. of Tokyo, Tokyo, Japan
Abstract :
We propose a gas cluster ion beam treatment for silicon waveguide trimming and demonstrated this treatment can effectively trim the silicon waveguides. This GCIB method is promising to trim resonators for a designed add/drop wavelength.
Keywords :
integrated optics; ion beam applications; optical design techniques; optical resonators; optical waveguides; silicon-on-insulator; GCIB method; Si; add-drop wavelength; gas cluster ion beam treatment; resonators; silicon waveguide trimming; Ion beams; Optical resonators; Optical surface waves; Optical waveguides; Photonics; Silicon; Surface treatment;
Conference_Titel :
Group IV Photonics (GFP), 2012 IEEE 9th International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4577-0826-8
DOI :
10.1109/GROUP4.2012.6324184
