DocumentCode :
1629909
Title :
Gamma-ray irradiation of ZnO thin film transistors and circuits
Author :
Zhao, Dalong ; Mourey, Devin A. ; Jackson, Thomas N.
Author_Institution :
Center for Thin Film Devices & Mater. Res. Inst., Penn State Univ., University Park, PA, USA
fYear :
2010
Firstpage :
241
Lastpage :
242
Abstract :
The radiation tolerance of electronic devices and circuits is of interest for space and some other harsh environment applications. Properly designed deep submicron gate length Si MOSFETs can have small threshold voltage shift and leakage increase for doses of 100 kGy (10 Mrad) or even larger, however polysilicon thin film transistors (TFTs) show significant changes at much lower dose (<; 1 kGy) and a-Si:H TFTs have volt-range threshold voltage shift for 10 kGy dose. We report here the effects of gamma-ray irradiation on plasma enhanced atomic layer deposition (PEALD) ZnO TFTs and circuits.
Keywords :
MOSFET; atomic layer deposition; gamma-rays; plasma deposition; radiation effects; silicon; thin film transistors; zinc compounds; PEALD; Si; Si MOSFET; TFT; ZnO; ZnO thin film transistor; deep submicron gate length; electronic device; gamma-ray irradiation; plasma enhanced atomic layer deposition; polysilicon thin film transistor; radiation tolerance; threshold voltage shift; Annealing; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2010
Conference_Location :
South Bend, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-6562-0
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2010.5551979
Filename :
5551979
Link To Document :
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