Title :
A new machine for the automatic position-dependent orientation measurement of at-cut quartz wafers
Author :
Bradaczek, H.-A. ; Bradaczek, H. ; Pianowski, H. ; Kononovich, A.V. ; Hildebrandt, G.
Author_Institution :
Res. Center, EFG Int., Berlin, Germany
fDate :
6/23/1905 12:00:00 AM
Abstract :
A new X-ray machine has been designed which allows the automatic cutting-angle measurement at a nearly arbitrary number of inspection points along the surface of large AT-cut quartz wafers and the corresponding sorting of these wafers. The measurement is based on the Ω-Scan Method combined with a laser-reflection registration and provides additionally the amount of the XX´ miscutting angle and data about the surface topography. Sorting criteria to be qualified by the user may be all these values as well as their spreads or standard deviations. The sorting part of the machine will be specified for the actual wafer dimensions. Capacity (up to a few thousand wafers) and cycle time (e.g., 1 minute per wafer) depend on the wafer size and the number of inspection points
Keywords :
X-ray apparatus; angular measurement; crystal resonators; cutting; goniometers; inspection; surface topography; Ω-Scan Method; EFG machine design; SiO2; X-ray machine; arbitrary inspection points; automatic cutting-angle measurement; cutting angle reproducibility; cycle time; large AT-cut quartz wafers; laser-reflection registration; miscutting angle; number of inspection points; position-dependent orientation measurement; surface topography; wafers sorting; Inspection; Laser beam cutting; Lattices; Optical reflection; Position measurement; Rotation measurement; Sorting; Surface emitting lasers; Surface topography; X-ray lasers;
Conference_Titel :
Frequency Control Symposium and PDA Exhibition, 2001. Proceedings of the 2001 IEEE International
Conference_Location :
Seattle, WA
Print_ISBN :
0-7803-7028-7
DOI :
10.1109/FREQ.2001.956255