DocumentCode :
1630620
Title :
Session Abstract
Author :
Wu, Cheng-Wen
Author_Institution :
National Tsing Hua University
fYear :
2006
Firstpage :
128
Lastpage :
129
Abstract :
In nanometer IC manufacturing, testing plays an even more important role than ever. The concern is no longer just defect screening and test coverage, but also reliability and yield. We have three speakers representing three major IC foundries, respectively. They will talk about the challenges they have seen from past experiences, and give directions of the trend regarding test practices, including failure/defect analysis and diagnosis, yield enhancement, DFT, etc.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Test Symposium, 2006. Proceedings. 24th IEEE
Print_ISBN :
0-7695-2514-8
Type :
conf
DOI :
10.1109/VTS.2006.68
Filename :
1617574
Link To Document :
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