DocumentCode :
1630886
Title :
The effects of hydrogen on current gain and emitter resistance of poly emitter bipolar transistors
Author :
Zhao, J. ; Li, G.P. ; Liao, K.Y. ; Chin, M.R. ; Vu, T. ; Sun, J.Y.-C.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Irvine, CA, USA
fYear :
1993
Firstpage :
223
Lastpage :
226
Abstract :
The effects of hydrogen passivation at the polysilicon grain boundaries and poly/mono-silicon interface on inducing a β increase and Re decrease are investigated in poly emitter transistors. Increase of β and decrease of Re are attributed to the reduction of effective recombination velocity of minority carriers and the decrease of potential barrier for majority carrier transport in the poly emitters by the passivation of silicon dangling bonds, respectively. The implications of the hydrogen passivation on β and Re for devices with a RTA emitter are also discussed
Keywords :
bipolar transistors; H plasma treatment; RTA emitter; Si; current gain; dangling bonds; effective recombination velocity; elemental semiconductor; emitter resistance; majority carrier transport; minority carriers; passivation; poly/mono interface; polysilicon emitter bipolar transistors; polysilicon grain boundaries; potential barrier; Bipolar transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCOMS Circuits and Technology Meeting, 1993., Proceedings of the 1993
Conference_Location :
Minneapolis, MN
Print_ISBN :
0-7803-1316-X
Type :
conf
DOI :
10.1109/BIPOL.1993.617503
Filename :
617503
Link To Document :
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