DocumentCode :
1632143
Title :
Influence of carrier transport on drain-current variability of MOSFETs
Author :
Ohmori, Kenji ; Shiraishi, Kenji ; Yamada, Keisaku
Author_Institution :
Nanotechnol. Lab., Waseda Univ., Tokyo, Japan
fYear :
2010
Firstpage :
879
Lastpage :
882
Abstract :
We have investigated static variability of p-MOSFETs by evaluating the drain current under various conditions of gate and drain voltages. The value of drain current variability (σId/Id) is proportional to (LW)-1/2 before the short channel effect appears, being similar to that of Vt variability. The magnitude of σId/Id decreases as the gate overdrive (Vg-Vt) decreases and classified into two regimes that corresponds to the carrier conduction mechanisms, i.e., diffusion and drift transports. This result strongly suggests that the dominant factors for determining σId/Id values are related to the carrier conduction mechanisms.
Keywords :
MOSFET; high-k dielectric thin films; carrier conduction mechanism; carrier transport; diffusion transport; drain current variability; drain voltage; drift transport; gate overdrive; gate voltage; metal-high-k gate stack structure; p-MOSFET; short channel effect; Correlation; Logic gates; MOSFET circuits; MOSFETs; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667460
Filename :
5667460
Link To Document :
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