• DocumentCode
    1632190
  • Title

    Raman scattering investigation of defects in thick homoepitaxial 4H-SiC films

  • Author

    Wu, Hailei ; Sun, Guosheng ; Yan, Guoguo ; Wang, Lei ; Zhao, Wanshun ; Liu, Xingfang ; Zeng, Yiping ; Wen, Jialiang

  • Author_Institution
    Novel Semicond. Mater. Lab., Chinese Acad. of Sci., Beijing, China
  • fYear
    2010
  • Firstpage
    1569
  • Lastpage
    1571
  • Abstract
    Three types of defects, namely comet I, comet II and carrot, in thick 4H-SiC homoepilayer were investigated by the micro-Raman scattering measurements. Comet defects were originated from certain cores which caused by the point defects or the inclusions on the surface of the substrate. 3C-SiC inclusions, which were not contained in carrot, were found in comet defects. The different distribution of 3C-SiC in comet I and comet II was investigated by using micro-Raman scattering measurement. The formation mechanisms of these three defects were discussed.
  • Keywords
    Raman spectra; inclusions; point defects; semiconductor epitaxial layers; silicon compounds; wide band gap semiconductors; 3C-SiC inclusions; 4H-SiC homoepilayer; Raman scattering; SiC; carrot defects; comet I defects; comet II defects; defect formation mechanism; microRaman spectra; point defects; thick homoepitaxial 4H-SiC films; Epitaxial growth; Measurement by laser beam; Raman scattering; Silicon carbide; Substrates; 3C inclusions; 4H-SiC; carrot; comet; micro-Raman;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667462
  • Filename
    5667462