Title :
Raman scattering investigation of defects in thick homoepitaxial 4H-SiC films
Author :
Wu, Hailei ; Sun, Guosheng ; Yan, Guoguo ; Wang, Lei ; Zhao, Wanshun ; Liu, Xingfang ; Zeng, Yiping ; Wen, Jialiang
Author_Institution :
Novel Semicond. Mater. Lab., Chinese Acad. of Sci., Beijing, China
Abstract :
Three types of defects, namely comet I, comet II and carrot, in thick 4H-SiC homoepilayer were investigated by the micro-Raman scattering measurements. Comet defects were originated from certain cores which caused by the point defects or the inclusions on the surface of the substrate. 3C-SiC inclusions, which were not contained in carrot, were found in comet defects. The different distribution of 3C-SiC in comet I and comet II was investigated by using micro-Raman scattering measurement. The formation mechanisms of these three defects were discussed.
Keywords :
Raman spectra; inclusions; point defects; semiconductor epitaxial layers; silicon compounds; wide band gap semiconductors; 3C-SiC inclusions; 4H-SiC homoepilayer; Raman scattering; SiC; carrot defects; comet I defects; comet II defects; defect formation mechanism; microRaman spectra; point defects; thick homoepitaxial 4H-SiC films; Epitaxial growth; Measurement by laser beam; Raman scattering; Silicon carbide; Substrates; 3C inclusions; 4H-SiC; carrot; comet; micro-Raman;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667462