DocumentCode
1632190
Title
Raman scattering investigation of defects in thick homoepitaxial 4H-SiC films
Author
Wu, Hailei ; Sun, Guosheng ; Yan, Guoguo ; Wang, Lei ; Zhao, Wanshun ; Liu, Xingfang ; Zeng, Yiping ; Wen, Jialiang
Author_Institution
Novel Semicond. Mater. Lab., Chinese Acad. of Sci., Beijing, China
fYear
2010
Firstpage
1569
Lastpage
1571
Abstract
Three types of defects, namely comet I, comet II and carrot, in thick 4H-SiC homoepilayer were investigated by the micro-Raman scattering measurements. Comet defects were originated from certain cores which caused by the point defects or the inclusions on the surface of the substrate. 3C-SiC inclusions, which were not contained in carrot, were found in comet defects. The different distribution of 3C-SiC in comet I and comet II was investigated by using micro-Raman scattering measurement. The formation mechanisms of these three defects were discussed.
Keywords
Raman spectra; inclusions; point defects; semiconductor epitaxial layers; silicon compounds; wide band gap semiconductors; 3C-SiC inclusions; 4H-SiC homoepilayer; Raman scattering; SiC; carrot defects; comet I defects; comet II defects; defect formation mechanism; microRaman spectra; point defects; thick homoepitaxial 4H-SiC films; Epitaxial growth; Measurement by laser beam; Raman scattering; Silicon carbide; Substrates; 3C inclusions; 4H-SiC; carrot; comet; micro-Raman;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667462
Filename
5667462
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