• DocumentCode
    1632415
  • Title

    Study on switching performance of VOx thin film in THz band

  • Author

    Chen, Tao ; Hu, Ming ; Tan, Lei ; Wang, Liu-Chen ; Li, Li

  • Author_Institution
    Sensitive Mater. & Sensors Lab., Tianjin Univ., Tianjin, China
  • fYear
    2010
  • Firstpage
    1560
  • Lastpage
    1562
  • Abstract
    Vanadium oxide(VOx) is one kind of mixture with different valences, and in addition to vanadium dioxide(VO2), the optical properties of other vanadium oxidations with different valences get few attention. In the present study, VOx thin film was grown on silicon substrates by direct current facing targets magnetron sputtering. VOx thin film was characterized by XPS (X-ray photoelectron spectroscopy) to determine component, and by THz-TDS (THz Time-domain spectroscopy system) to determine optical transmission behavior in the 0.3~2.5THz with the exciting laser of 532nm. The results show that, the main valences of VOx thin film are +3,+4,+5, before and after continuous light excitation, a very significant change in THz transmission is observed. The optical transmission of VOx thin film decreases by 60% after excitation. And finally, we briefly analyzed the switching performance with the energy band structure of VOx.
  • Keywords
    X-ray photoelectron spectra; light transmission; oxidation; semiconductor thin films; sputtering; vanadium compounds; THz band; THz time-domain spectroscopy system; X-ray photoelectron spectroscopy; optical transmission; switching performance; thin film; vanadium oxidations; Laser excitation; Laser transitions; Optical films; Optical reflection; Optical switches; Silicon; Ultrafast optics; THz-TDS; VOx; optical property;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667471
  • Filename
    5667471