DocumentCode
1632802
Title
General scaling of pulse shortening in explosive-emission-driven microwave sources
Author
Benford, J. ; Price, D.
Author_Institution
Microwave Sci., Lafayette, CA, USA
fYear
1998
Firstpage
206
Abstract
Summary form only given, as follows. Microwave generation in devices that depend on synchronization between an electron beam and a resonant cavity or slow wave structure can be disrupted by changes in either. Explosive-emission-driven microwave sources use plasma as the electron source in the diode. This plasma is conductive enough to act as the boundary for both the applied diode voltage and the microwave electric field. The motion of this plasma can effectively change the dimensions of either the electron beam diode or the cavity and will thereby cause resonance destruction. This shortens the microwave pulse length /spl tau//sub /spl mu//. A general model of the process predicts that, for a Child-Langmuir diode, microwave power will fall as P/spl prop//spl tau//sub /spl mu///sup -53/ and that pulse energy will fall as E/spl prop//spl tau//sub /spl mu///sup -2/3/. Therefore, energy efficiency declines as the pulse length is extended. We compare with data from magnetrons, MILOs and BWOs, with good agreement. Explosive-emission-driven microwave sources are fundamentally limited by the speed of the diode plasma and can be improved by finding cathode materials that generate slower plasmas.
Keywords
backward wave oscillators; microwave generation; BWO; Child-Langmuir diode; MILO; applied diode voltage; cathode materials; electron beam; electron beam diode; electron source; energy efficiency; explosive-emission-driven microwave sources; magnetrons; microwave electric field; microwave generation; microwave power; microwave pulse length; pulse energy; pulse shortening scaling; resonance destruction; resonant cavity; slow wave structure; Diodes; Electron beams; Electron sources; Microwave devices; Microwave generation; Plasma devices; Plasma materials processing; Plasma sources; Plasma waves; Resonance;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location
Raleigh, NC, USA
ISSN
0730-9244
Print_ISBN
0-7803-4792-7
Type
conf
DOI
10.1109/PLASMA.1998.677697
Filename
677697
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