DocumentCode :
1632814
Title :
Analysis of software process improvement experience using the project visibility index
Author :
Sakamoto, Keishi ; Niihara, Naoki ; Tanaka, Toshifumi ; Nakakoji, Kumiyo ; Kishida, Kouichi
Author_Institution :
OMRON Corp., Shiga, Japan
fYear :
1996
Firstpage :
139
Lastpage :
148
Abstract :
Based on the capability maturity model (CMM), process improvement at OMRON, a Japanese microprocessor manufacturer, increased project predictability in three ways: accuracy, variability, and performance. The authors use the project visibility index (PVI) and other measurements to quantitatively demonstrate this. Qualitative analysis of how and why OMRON achieved higher project visibility and increases in the QCD (quality, cost, and delivery on time) factors are supported with data on review-effort ratios and productivity. They identify factors directly affected by high project visibility
Keywords :
DP industry; economics; electronics industry; human resource management; project management; software cost estimation; software development management; software quality; Japanese microprocessor manufacturer; OMRON; accuracy; capability maturity model; cost; performance; productivity; project predictability; project visibility; project visibility index; qualitative analysis; quality; review-effort ratios; software process improvement; timely delivery; variability; Capability maturity model; Coordinate measuring machines; Costs; Information analysis; Productivity; Programming; Project management; Software development management; Software engineering; Software quality;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Software Engineering Conference, 1996. Proceedings., 1996 Asia-Pacific
Conference_Location :
Seoul
Print_ISBN :
0-8186-7638-8
Type :
conf
DOI :
10.1109/APSEC.1996.566749
Filename :
566749
Link To Document :
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