DocumentCode :
1634066
Title :
Material processing system based on a gyrotron powered millimeter-wave beam
Author :
Fliflet, A.W. ; Sklyarevich, V.E.
Author_Institution :
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
fYear :
1998
Firstpage :
208
Abstract :
Summary form only given. The high intensity millimeter-wave beams (10/sup 3/-10/sup 5/ W/cm/sup 2/) that can be generated by powerful gyrotron oscillators have unique capabilities for rapid, selective heating to extremely high temperatures of nonmetallic materials. A new CW gyrotron based material processing system is being set up at the Naval Research Laboratory (NRL) jointly by NRL, and the Center for Remote Sensing (CRS) to investigate the application of such beams to important areas of material processing including: coating of materials, soldering and brazing, and treatment of ceramics and polymers. This paper will describe the processing system, including the gyrotron, work chamber, and control system; and the characteristics of the Gaussian-type beam which can be focussed and manipulated to produce beam cross sections of various sizes and shapes. The development of novel processing techniques for applications such as brazing ceramics to ceramics and ceramics to metals with high temperature brazes and solders will be discussed.
Keywords :
gyrotrons; materials preparation; microwave oscillators; Center for Remote Sensing; Gaussian-type beam; Naval Research Laboratory; beam cross sections; ceramic to ceramic brazing; ceramic to metal brazing; coating; control system; extremely high temperatures; gyrotron; gyrotron oscillators; gyrotron powered millimeter-wave beam; high intensity millimeter-wave beams; high temperature brazes; material processing system; materials treatment; nonmetallic materials; polymers; rapid selective heating; soldering; work chamber; Ceramics; Gyrotrons; Heating; Materials processing; Millimeter wave technology; Oscillators; Power generation; Remote sensing; Shape control; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677702
Filename :
677702
Link To Document :
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