Title :
Diagnostics of ablation plasma generated by intense, pulsed ion beam
Author :
Jiang, W. ; Hashimoto, N. ; Yatsui, K.
Author_Institution :
Extreme Energy Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan
Abstract :
High-temperature, high-density ablation plasma generated by intense, pulsed ion beam was studied experimentally by using high-speed photography. Since this plasma is used for thin film deposition, the energy deposition of the plasma on the substrate was also measured by using calorimetry. From the diagnostic results, we have obtained that the ablation plasma stays around the substrate surface for /spl sim/30 /spl mu/s that gives rise to instantaneous substrate surface temperature of a few thousand degrees.
Keywords :
calorimetry; high-speed optical techniques; ion beam assisted deposition; plasma diagnostics; plasma production; ablation plasma diagnostics; calorimetry; energy deposition measurement; high-density ablation plasma generation; high-speed photography; intense pulsed ion beam; substrate surface temperature; thin film deposition; Calorimetry; Energy measurement; Ion beams; Photography; Plasma diagnostics; Plasma measurements; Plasma temperature; Pulse generation; Sputtering; Substrates;
Conference_Titel :
Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5498-2
DOI :
10.1109/PPC.1999.823696
