Diagnostics of ablation plasma generated by intense, pulsed ion beam

Author

Jiang, W. ; Hashimoto, N. ; Yatsui, K.

Author_Institution

Extreme Energy Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan

Volume

2

fYear

1999

Firstpage

1037

Abstract

High-temperature, high-density ablation plasma generated by intense, pulsed ion beam was studied experimentally by using high-speed photography. Since this plasma is used for thin film deposition, the energy deposition of the plasma on the substrate was also measured by using calorimetry. From the diagnostic results, we have obtained that the ablation plasma stays around the substrate surface for /spl sim/30 /spl mu/s that gives rise to instantaneous substrate surface temperature of a few thousand degrees.

Keywords

calorimetry; high-speed optical techniques; ion beam assisted deposition; plasma diagnostics; plasma production; ablation plasma diagnostics; calorimetry; energy deposition measurement; high-density ablation plasma generation; high-speed photography; intense pulsed ion beam; substrate surface temperature; thin film deposition; Calorimetry; Energy measurement; Ion beams; Photography; Plasma diagnostics; Plasma measurements; Plasma temperature; Pulse generation; Sputtering; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International

Conference_Location

Monterey, CA, USA

Print_ISBN

0-7803-5498-2

Type

conf

DOI

10.1109/PPC.1999.823696

Filename

823696