Title :
Pyrometric temperature control system for microwave processing of materials
Author :
Pert, E. ; Calame, Jeffrey P. ; Gershon, D. ; Carmel, Y.
Author_Institution :
Inst. for Plasma Res., Maryland Univ., College Park, MD, USA
Abstract :
Summary form only given. Accurate temperature measurements and uniform processing of a material with microwaves can be difficult with thermocouples that perturb the electromagnetic field. Arcing and field intensification is particularly a problem with low loss materials that do not couple well. Optical pyrometers offer a non-invasive alternative, but are generally restricted to surface temperature measurements and are usually non-linear over the temperature range of interest. Improved accuracy over the entire range of interest is possible with an integrated approach using a PC to calibrate the pyrometer against a thermocouple reference. A pyrometer-retrofitted microwave processing system that can measure and control from 40/spl deg/C to 1600/spl deg/C is presented.
Keywords :
materials preparation; pyrometers; spectral methods of temperature measurement; temperature control; thermocouples; 40 to 1600 C; arcing; electromagnetic field; field intensification; integrated approach; low loss materials; materials processing; microwave processing; microwaves; optical pyrometer; pyrometer-retrofitted microwave processing system; pyrometric temperature control system; temperature measurements; thermocouple reference; thermocouples; Educational institutions; Electromagnetic fields; Laboratories; Optical losses; Optical materials; Plasma materials processing; Plasma measurements; Plasma temperature; Temperature control; Temperature measurement;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677705
