• DocumentCode
    1635097
  • Title

    Deflection data correction system of large areas electron beam direct imaging for printed wiring boards

  • Author

    Yamaji, Shigeru ; Kamio, Masashi ; Miura, Akira ; Noguchi, Yo ; Iwami, Taizo ; Tobuse, Hiroaki ; Hara, Katsunori

  • Author_Institution
    Mitsubishi Electr. Corp., Hyogo, Japan
  • fYear
    1990
  • Firstpage
    564
  • Abstract
    A novel electron beam system for large-area patterning of printed wiring boards (PWBs) has been developed. The system features a large field deflection, high-scanning speed, and stably focused beam in the large field. In order to deflect electron beams in a large area with high precision, particular attention was paid to the construction of a deflection data correction system. Various errors originating from the optics are measured, and the data to correct for these errors are calculated and stored prior to imaging. These data are output to the optics column at a rate of up to 10 MHz during imaging. In addition, sensors provide the data to correct the position error originating from the height variations and warp of the PWB for each field. It is confirmed that the beam position precision is ±12 μm for a field of 52 mm×52 mm
  • Keywords
    CAD/CAM; electron beam lithography; engineering graphics; printed circuit manufacture; 10 MHz; CAD/CAM; PCB manufacture; deflection data correction system; electron beam direct imaging; electron beam lithography; large field deflection; precision; printed wiring boards; Computer aided manufacturing; Electron beams; Electron optics; Error correction; Focusing; Optical films; Optical imaging; Position measurement; Structural beams; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industrial Electronics Society, 1990. IECON '90., 16th Annual Conference of IEEE
  • Conference_Location
    Pacific Grove, CA
  • Print_ISBN
    0-87942-600-4
  • Type

    conf

  • DOI
    10.1109/IECON.1990.149203
  • Filename
    149203