Title :
Fabrication and analysis of super-hydrophobic ZnO film for microfluidic devices
Author :
Yang, Sheng ; Wang, Yiting ; Zeng, Xiangyu ; Zhou, Jia
Author_Institution :
Dept. of Microelectron., Fudan Univ., Shanghai, China
Abstract :
A simple method of electrochemical deposition was adopted to fabricate super-hydrophobic ZnO surface. A contact angle for water of 159.9° was achieved through teflon 1600 modification. The impacts of deposit time and operating voltage on the hydrophobic characteristics and the capacitance characteristics of ZnO layer were also analyzed.
Keywords :
II-VI semiconductors; contact angle; electrochemistry; hydrophobicity; microfabrication; microfluidics; water; wide band gap semiconductors; zinc compounds; ZnO; contact angle; electrochemical deposition; microfluidic devices; superhydrophobic ZnO film; superhydrophobic ZnO surface; teflon 1600 modification; water; Films; Microfluidics; Surface impedance; Surface roughness; Surface topography; Surface treatment; Zinc oxide;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667582
