DocumentCode :
1635520
Title :
Carbon based graphene nanoelectronics technologies
Author :
Sung, Chun-Yung
Author_Institution :
IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2010
Firstpage :
1192
Lastpage :
1193
Abstract :
Graphene, a two-dimensional carbon form with the highest intrinsic carrier mobility and many desirable physical properties at room temperature, is considered a promising material for ultrahigh speed and low power devices with the possibility of strong scaling potential due to the ultra-thin body. (Fig. 1) [1-3] Here IBM reports progress in graphene nanoelectronics, synthesizing wafer-scale monolayer-controlled graphene and fabricating high-speed single atomic layer graphene FETs (GFET) with the highest value reported cut-off frequency (fT) approaching 100 GHz, exceeding that of the same gate length Si FETs. It is achieved by improving gate oxide deposition and reducing series resistance. Systematic characterization and small-signal models enable further engineering and optimization for even higher performance. The high Ion/Ioff ratios from bi-layer graphene suggest potential not only for analog but also for logic applications.
Keywords :
carrier mobility; elemental semiconductors; graphene; nanoelectronics; optimisation; C; bilayer graphene; carbon based graphene nanoelectronics technology; gate oxide deposition; high-speed single atomic layer graphene FET; intrinsic carrier mobility; optimization; two-dimensional carbon; wafer-scale monolayer-controlled graphene; Atomic layer deposition; Frequency measurement; Gain measurement; Logic gates; Silicon; Silicon carbide; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667598
Filename :
5667598
Link To Document :
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