DocumentCode
1635520
Title
Carbon based graphene nanoelectronics technologies
Author
Sung, Chun-Yung
Author_Institution
IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
fYear
2010
Firstpage
1192
Lastpage
1193
Abstract
Graphene, a two-dimensional carbon form with the highest intrinsic carrier mobility and many desirable physical properties at room temperature, is considered a promising material for ultrahigh speed and low power devices with the possibility of strong scaling potential due to the ultra-thin body. (Fig. 1) [1-3] Here IBM reports progress in graphene nanoelectronics, synthesizing wafer-scale monolayer-controlled graphene and fabricating high-speed single atomic layer graphene FETs (GFET) with the highest value reported cut-off frequency (fT) approaching 100 GHz, exceeding that of the same gate length Si FETs. It is achieved by improving gate oxide deposition and reducing series resistance. Systematic characterization and small-signal models enable further engineering and optimization for even higher performance. The high Ion/Ioff ratios from bi-layer graphene suggest potential not only for analog but also for logic applications.
Keywords
carrier mobility; elemental semiconductors; graphene; nanoelectronics; optimisation; C; bilayer graphene; carbon based graphene nanoelectronics technology; gate oxide deposition; high-speed single atomic layer graphene FET; intrinsic carrier mobility; optimization; two-dimensional carbon; wafer-scale monolayer-controlled graphene; Atomic layer deposition; Frequency measurement; Gain measurement; Logic gates; Silicon; Silicon carbide; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667598
Filename
5667598
Link To Document