• DocumentCode
    1635520
  • Title

    Carbon based graphene nanoelectronics technologies

  • Author

    Sung, Chun-Yung

  • Author_Institution
    IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2010
  • Firstpage
    1192
  • Lastpage
    1193
  • Abstract
    Graphene, a two-dimensional carbon form with the highest intrinsic carrier mobility and many desirable physical properties at room temperature, is considered a promising material for ultrahigh speed and low power devices with the possibility of strong scaling potential due to the ultra-thin body. (Fig. 1) [1-3] Here IBM reports progress in graphene nanoelectronics, synthesizing wafer-scale monolayer-controlled graphene and fabricating high-speed single atomic layer graphene FETs (GFET) with the highest value reported cut-off frequency (fT) approaching 100 GHz, exceeding that of the same gate length Si FETs. It is achieved by improving gate oxide deposition and reducing series resistance. Systematic characterization and small-signal models enable further engineering and optimization for even higher performance. The high Ion/Ioff ratios from bi-layer graphene suggest potential not only for analog but also for logic applications.
  • Keywords
    carrier mobility; elemental semiconductors; graphene; nanoelectronics; optimisation; C; bilayer graphene; carbon based graphene nanoelectronics technology; gate oxide deposition; high-speed single atomic layer graphene FET; intrinsic carrier mobility; optimization; two-dimensional carbon; wafer-scale monolayer-controlled graphene; Atomic layer deposition; Frequency measurement; Gain measurement; Logic gates; Silicon; Silicon carbide; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667598
  • Filename
    5667598