Title :
Single-electron transistors fabricated by electroless plated nanogap electrodes and chemisorbed Au nanoparticles
Author_Institution :
Mater. & Struct. Lab., Tokyo Inst. of Technol., Yokohama, Japan
Abstract :
Coulomb diamonds were clearly observed on single-electron transistors (SETs) fabricated by bottom-up processes of electroless plating of Au nanogap electrodes and chemisorption of a Au nanoparticle at 80 K. In the drain current-drain voltage characteristics, Coulomb staircases were modulated by the side gate voltage. Tunneling resistances and source/drain/gate capacitances of the SET were evaluated by fitting the theoretical Coulomb staircase based on the full orthodox theory in a double-barrier tunneling junction to the experimental results of Coulomb blockade under the application of side gate voltages.
Keywords :
Coulomb blockade; chemisorption; diamond; electrochemical electrodes; gold; nanoparticles; single electron transistors; Au; C; Coulomb blockade; Coulomb diamonds; Coulomb staircase; chemisorption; double barrier tunneling junction; electroless plating; gold nanogap electrodes; gold nanoparticle; orthodox theory; side gate voltage; single electron transistors; source/drain/gate capacitance; temperature 80 K; tunneling resistances; Capacitance; Diamond-like carbon; Electrodes; Gold; Logic gates; Nanoparticles; Tunneling;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667599