DocumentCode :
1635564
Title :
Numerical study of performance comparison between junction and junctionless thin-film transistors
Author :
Pai, Ching-Yao ; Lin, Jyi-Tsong ; Wang, Shih-Wei ; Lin, Chia-Hsien ; Kuo, Yu-Sheng ; Eng, Yi-Chuen ; Lin, Po-Hsieh ; Fan, Yi-Hsuan ; Tai, Chih-Hsuan ; Chen, Hsuan-Hsu ; Chen, Cheng-Hsin ; Lu, Kuan-Yu
Author_Institution :
Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
fYear :
2010
Firstpage :
1410
Lastpage :
1412
Abstract :
This paper for the first time presents a performance comparison between junction and junctionless thin-film transistors (TFTs) by using TCAD simulations. Note that the DIBL and S.S. of a junctionless TFT (JLTFT) are larger and higher, respectively, than those of its junction TFT (JTFT) counterpart. Although the JLTFT gets a higher current drive based on the same Vov as compared with the JTFT, its short-channel characteristics are worse and degraded. These results can be attributed to the fact that the major carriers in channel region for a JTFT make itself a barrier to carrier scattering, whereas, the JTFT does not have this problem, leading to get a high current drive. On the other hand, it may be owing to the grain boundary effects for a JLTFT to degrade its short-channel behavior. Fortunately, these results are still acceptable for scaled dimensions of TFTs.
Keywords :
junction gate field effect transistors; technology CAD (electronics); thin film transistors; DIBL; JLTFT; JTFT; TCAD simulation; carrier scattering; junction thin-film transistor; junctionless thin-film transistor; short-channel characteristic; Grain boundaries; Junctions; Lattices; Logic gates; Scattering; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667600
Filename :
5667600
Link To Document :
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