DocumentCode :
1635605
Title :
Intense ion beams for surface treatment applications
Author :
Renk, Timothy J. ; Johnson, D.C. ; Senft, Daniel C. ; Sorensen, R. ; Thompson, Michael O. ; Grabowski, K.S. ; Buchheit, R.G.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fYear :
1998
Firstpage :
212
Abstract :
Summary form only given. Intense pulsed ion beams have been be used to achieve a rapid melt and resolidification (RMR) of the surface layer of metals, ceramics, and silicon. This leads to enhancements in wear durability and corrosion resistance. RMR treatment has been applied both to simple alloys and alloys onto which a thin-film coating has been applied. The beam then mixes this coating into the substrate. The nature of beam-induced effects depends upon the treatment ion(s). In particular, heavier beam ions (e.g. N, Kr, Xe) produce a smoother surface topography compared to proton treatment. We report on experiments aimed at optimizing beam parameters from these heavier ions. Alloys and bi-metal combinations were treated on the RHEPP-I facility at Sandia National Laboratories (0.5 MV, up to 0.5 us at sample location, <10 J/cm/sup 2/). Ions are generated by the MAP (Magnetically confined Anode Plasma) gas-breakdown ion source operated in a magnetically insulated ion diode. The typical ion range for singly-ionized N is 1 /spl mu/m Numerical modeling of thermal histories neglecting ablation have yielded predictions consistent with diagnostic measurements of treated samples. Treated samples have been characterized by scanning electron microscopy (SEM), Rutherford Backscattering Spectrometry (RES), X-Ray Diffraction (XRD), cross-sectional Transmission Electron Microscopy (XTEM), and electrochemical corrosion tests.
Keywords :
Rutherford backscattering; X-ray diffraction; alloys; ion beam effects; ion-surface impact; scanning electron microscopy; surface treatment; transmission electron microscopy; 0.5 MV; Faraday cup arrays; Kr; N; RHEPP-I facility; Rutherford backscattering spectrometry; Sandia National Laboratories; X-ray diffraction; Xe; alloys; beam parameter measurements; beam parameter optimisation; beam-induced effects; bi-metal combinations; ceramics; corrosion resistance; cross-sectional transmission electron microscopy; electrochemical corrosion tests; gas breakdown mechanisms; intense pulsed ion beams; magnetically confined anode plasma gas-breakdown ion source; magnetically insulated Faraday cups; magnetically insulated ion diode; melt; metals; pinhole shadowboxes; proton treatment; resolidification; scanning electron microscopy; silicon; source plasma; surface layer; surface modification; surface processes; surface topography; surface treatment applications; thin-film coating; three-component beam; treatment ion; wear durability; Coatings; Corrosion; Ion beams; Magnetic confinement; Plasma confinement; Plasma measurements; Scanning electron microscopy; Surface resistance; Surface topography; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677712
Filename :
677712
Link To Document :
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