DocumentCode :
1635736
Title :
Current transport, gate dielectrics and band gap engineering in graphene devices
Author :
Zhu, Wenjuan ; Perebeinos, Vasili ; Neumayer, Deborah ; Freitag, Marcus ; Jenkins, Keith ; Zhu, Yu ; Avouris, Phaedon
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2010
Firstpage :
1214
Lastpage :
1217
Abstract :
In this work, we studied current transport in mono-, bi-and tri-layer graphene. We find that both the temperature and carrier density dependencies in monolayer and bi-/tri-layers are diametrically opposite. These difference can be understood by the different density-of-states and the additional screening of the electrical field of the substrate surface polar phonons in bi-layer/tri-layer graphenes. We also find that silicon nitride can provide uniform coverage of graphene in field-effect transistors while preserving the channel mobility. Using this insulator, we studied field-induced band-gap or band-overlap in graphene with various numbers of layers.
Keywords :
carrier density; dielectric materials; field effect transistors; graphene; phonons; surface phonons; band gap engineering; bandoverlap; carrier density dependencies; channel mobility; electrical field; field-effect transistors; field-induced band-gap; gate dielectrics; graphene devices; substrate surface polar phonons; Charge carrier density; Dielectrics; Logic gates; Phonons; Photonic band gap; Scattering; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667607
Filename :
5667607
Link To Document :
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