DocumentCode :
1635755
Title :
Mechanisms of nanochannel formation processes: Thermal oxidation of Si nanostructures and graphene formation on SiC
Author :
Kageshima, Hiroyuki
Author_Institution :
NTT Basic Res. Labs., Nippon Telegraph & Telephone Corp., Atsugi, Japan
fYear :
2010
Firstpage :
1218
Lastpage :
1221
Abstract :
Two topics are introduced from our studies on the formation mechanisms of nanochannels: thermal silicon oxidation to form silicon wire channels, and silicon-carbide thermal decomposition to form atomically thin graphene channels. Silicon emission and oxide viscous flow processes are necessary to explain thermal oxidation to form silicon nanochannels. Interfacial growth should be considered for the epitaxial graphene formation on silicon-carbide substrate.
Keywords :
epitaxial growth; graphene; microchannel flow; nanostructured materials; oxidation; silicon compounds; wide band gap semiconductors; SiC; epitaxial graphene formation; nanochannel formation processes; nanostructures; silicon carbide substrate; thermal oxidation; Epitaxial growth; Oxidation; Silicon; Silicon carbide; Strain; Substrates; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667608
Filename :
5667608
Link To Document :
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