DocumentCode
163577
Title
Monitoring of W accumulation in ion implanter beam line utilizing portable XRF instrument
Author
Kawasaki, Yoji ; Fuse, G. ; Koike, Masakazu ; Ooga, E. ; Morita, Takahito ; Tsukihara, Mitsukuni ; Sugitani, M.
Author_Institution
SEN Corp., Saijo, Japan
fYear
2014
fDate
18-20 May 2014
Firstpage
1
Lastpage
2
Abstract
It was attempted to monitor the tungsten (W) accumulation in the beam line of ion implanter utilizing a novel portable X-ray fluorescence (XRF). In the implanter after production running, some modules and consumable parts were effectively measured with the XRF instrument and it was verified that W atoms from the ion source area hit the chamber walls in AMU magnet and are accumulated there as predicted.
Keywords
X-ray fluorescence analysis; accumulation layers; ion implantation; ion sources; tungsten; AMU magnet; W accumulation; X-ray fluorescence; chamber walls; ion implanter beam line; ion source area; portable XRF instrument; Atomic measurements; Contamination; Instruments; Magnetic separation; Metals; Pollution measurement; Production;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology (IWJT), 2014 International Workshop on
Conference_Location
Shanghai
Type
conf
DOI
10.1109/IWJT.2014.6842032
Filename
6842032
Link To Document