Title :
A novel distributed control system for plasma immersion ion implantation control and automation
Author :
Liu, A.G. ; Wang, X.F. ; Tang, B.Y. ; Chu, Paul K. ; Ko, P.K. ; Cheng, Y.C.
Author_Institution :
Dept. of Phys. & Mater. Sci., City Polytech. of Hong Kong, Kowloon, Hong Kong
Abstract :
Summary form only given. The high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage pulse power supply, radio frequency plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, for Pill facility. Programmable logic controllers (PLC) are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation.
Keywords :
distributed control; ion implantation; plasma deposition; process control; programmable controllers; programmable logic devices; DH-485 network; MEVVA plasma sources; Microsoft Windows 95; Programmable logic controller; anti-interference ability; communication link; control system; distributed control system; electric field interference; electromagnetic field environment; field controllers; graphic mode; high voltage and electromagnetic field environment; high voltage pulse power supply; management station; plasma immersion ion implantation control; plasma immersion ion implantation control and automation; radio frequency plasma generator,; real time response; Communication system control; Control systems; Distributed control; Electromagnetic fields; Plasma immersion ion implantation; Plasma sources; Programmable control; Pulsed power supplies; Telecommunication network reliability; Voltage control;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677720