Title :
Plasma discharge properties of methane-argon and acetylene-argon discharges
Author :
Kim, B.K. ; Grotjohn, T.A.
Author_Institution :
Dept. of Electr. Eng., Michigan State Univ., East Lansing, MI, USA
Abstract :
Summary form only given. The discharge properties of methane-argon and acetylene-argon discharges generated in a microwave ECR plasma reactor are investigated. The discharges are utilized for the deposition of hydrogenated amorphous carbon thin films. The deposition reactor consists of a microwave plasma source with a RF biased substrate located downstream in the processing chamber. The films deposited with the two different gas mixtures have substantially different properties and this investigation is directed at quantifying the discharge composition to better understand the deposition process.
Keywords :
argon; gas mixtures; high-frequency discharges; organic compounds; plasma CVD; plasma diagnostics; 0 to -150 V; 1 to 5 mtorr; C; C film deposition; RF biased substrate; acetylene-Ar discharges; deposition process; deposition reactor; discharge composition; discharge generation; discharge properties; gas mixtures; hydrogenated amorphous carbon thin films; methane-Ar discharges; microwave ECR plasma reactor; microwave plasma source; plasma discharge properties; processing chamber; Argon; Chemical elements; Fault location; Plasma chemistry; Plasma confinement; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Substrates;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677750
