DocumentCode
1636705
Title
Enhanced electron attachment to highly-excited molecules and its applications in pulsed plasmas
Author
Pinnaduwage, L.A. ; Ding, W.X. ; McCorkle, D.L. ; Ma, C.Y.
Author_Institution
Oak Ridge Nat. Lab., TN, USA
Volume
2
fYear
1999
Firstpage
1322
Abstract
Studies conducted over the past several years have shown that dissociative electron attachment to highly-excited states of molecules have extremely large cross sections. Implications of this process for pulsed discharges used for H/sup -/ generation, material processing, and plasma remediation are discussed.
Keywords
Rydberg states; discharges (electric); dissociation; electron attachment; ion beams; molecule-electron collisions; plasma collision processes; plasma materials processing; H/sup -/ generation; dissociative electron attachment; enhanced electron attachment; high-Rydberg states; highly-excited molecules; material processing; plasma remediation; pulsed discharges; pulsed plasmas; Discharges; Electrons; Gas lasers; Laser excitation; Plasma applications; Plasma materials processing; Plasma properties; Pulse generation; Pulse modulation; Stationary state;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International
Conference_Location
Monterey, CA, USA
Print_ISBN
0-7803-5498-2
Type
conf
DOI
10.1109/PPC.1999.823770
Filename
823770
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