Title :
Enhanced electron attachment to highly-excited molecules and its applications in pulsed plasmas
Author :
Pinnaduwage, L.A. ; Ding, W.X. ; McCorkle, D.L. ; Ma, C.Y.
Author_Institution :
Oak Ridge Nat. Lab., TN, USA
Abstract :
Studies conducted over the past several years have shown that dissociative electron attachment to highly-excited states of molecules have extremely large cross sections. Implications of this process for pulsed discharges used for H/sup -/ generation, material processing, and plasma remediation are discussed.
Keywords :
Rydberg states; discharges (electric); dissociation; electron attachment; ion beams; molecule-electron collisions; plasma collision processes; plasma materials processing; H/sup -/ generation; dissociative electron attachment; enhanced electron attachment; high-Rydberg states; highly-excited molecules; material processing; plasma remediation; pulsed discharges; pulsed plasmas; Discharges; Electrons; Gas lasers; Laser excitation; Plasma applications; Plasma materials processing; Plasma properties; Pulse generation; Pulse modulation; Stationary state;
Conference_Titel :
Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5498-2
DOI :
10.1109/PPC.1999.823770
