DocumentCode :
163679
Title :
GaN technology for power RF applications: Present reliability roadblocks and future trends
Author :
Igic, P. ; Faramehr, S. ; Kalna, Karol
Author_Institution :
Electron. Syst. Design Centre, Swansea Univ., Swansea, UK
fYear :
2014
fDate :
12-14 May 2014
Firstpage :
77
Lastpage :
80
Abstract :
The current collapse and normally-on devices are the main roadblocks to the wider employment of the GaN technology. To explain the current collapse effect, surface and bulk trapping/de-trapping phenomena are modeled using 2D drift-diffusion and hydro-dynamic transport models by transient simulations within Silvaco TCAD. The current collapse next to 75% and 5% was observed due to surface and bulk trapping, respectively. The combined surface and bulk trapping is studied using a gate-lag technique showing a good qualitative agreement with experimental observations.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; hydrodynamics; semiconductor device models; semiconductor device reliability; wide band gap semiconductors; 2D drift-diffusion; GaN; GaN technology; Silvaco TCAD; bulk trapping-de-trapping phenomena; current collapse effect; gate-lag technique; hydrodynamic transport models; normally-on devices; power RF applications; reliability roadblocks; surface trapping-de-trapping phenomena; transient simulations; Aluminum gallium nitride; Charge carrier processes; Gallium nitride; HEMTs; High definition video; Logic gates; MODFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics Proceedings - MIEL 2014, 2014 29th International Conference on
Conference_Location :
Belgrade
Print_ISBN :
978-1-4799-5295-3
Type :
conf
DOI :
10.1109/MIEL.2014.6842089
Filename :
6842089
Link To Document :
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