DocumentCode :
1636792
Title :
Characterization of emitting carbon films
Author :
Tolt, Z.L. ; Fink, R.L. ; Yaniv, Z.
Author_Institution :
FEPET Inc., Austin, TX, USA
fYear :
1998
Firstpage :
226
Abstract :
Summary form only given. Carbon films having low threshold extraction field, high emission site density and high emission current density were characterized by UV-Raman spectroscopy and high resolution atomic force microscopy (AFM). An hypothesis of the nature of emission sites in these films is proposed in accordance with the analyses.
Keywords :
Raman spectra; atomic force microscopy; carbon; films; spectrochemical analysis; ultraviolet spectra; C; UV-Raman spectroscopy; emission sites; emitting C films; high emission current density; high emission site density; high resolution atomic force microscopy; low threshold extraction field; Atomic force microscopy; Carbon dioxide; Chemical industry; Chemical technology; Furnaces; Inductors; Plasma applications; Plasma chemistry; Plasma temperature; Power generation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677756
Filename :
677756
Link To Document :
بازگشت