DocumentCode :
1638148
Title :
Low leakage bulk silicon substrate based SDOI FINFETs
Author :
Liu, Jia ; Luo, Zhijiong ; Yin, Haizhou ; Zhu, Huilong ; Wang, Hefei ; Yuan, Feng
Author_Institution :
Inst. of Microelectron., Chinese Acad. of Sci., Beijing, China
fYear :
2010
Firstpage :
1820
Lastpage :
1822
Abstract :
This work presents a novel low leakage bulk substrate based SDOI (Source-Drain on Insulator) FINFET structure and a new integration scheme for fabrication thereof. Through simulation, SDOI FINFETs were thoroughly compared to Bulk FINFETs and SOI FINFETs. SDOI FINFETs clearly achieved SOI FINFETs like excellent subthreshold characteristics, low leakage current and low capacitance, while maintained high thermal conduction. By combining the benefits from the SOI FINFET and the Bulk FINFET, the SDOI FINFET shows a great potential to replace the planar MOSFET and to further extend Moore´s law.
Keywords :
MOSFET; heat conduction; leakage currents; silicon-on-insulator; FINFET structure; Moore´s law; SDOI FINFET; SOI FINFET; bulk FINFET; low capacitance; low leakage bulk silicon substrate; low leakage bulk substrate; low leakage current; planar MOSFET; source-drain on insulator; subthreshold characteristics; thermal conduction; Capacitance; Doping; FinFETs; Implants; Leakage current; Logic gates; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667687
Filename :
5667687
Link To Document :
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