DocumentCode :
1639005
Title :
Snapback and safe operating area of LDMOS transistors
Author :
Hower, P.L. ; Merchant, Shakila
Author_Institution :
Unitrode Corp., Merrimack, NH, USA
fYear :
1999
Firstpage :
193
Lastpage :
196
Abstract :
This paper deals with the measurement and prediction of the SOA boundary and the accompanying device physics. Results are given for n-channel LDMOS transistors having a self-aligned body diffusion. LDMOS SOA has been discussed previously in a number of papers, however, there is still a need for improving the overall understanding of this rather complicated subject. To be complete, thermal effects should also be included in the definition of SOA, however, these can be treated separately and we focus here on the "electrical SOA", which is defined by the Id-Vds boundary where snapback occurs.
Keywords :
power MOSFET; semiconductor device manufacture; semiconductor device models; Id-Vds boundary; LDMOS transistors; SOA boundary; device physics; n-channel LDMOSFET; safe operating area; self-aligned body diffusion; snapback; thermal effects; Displays; Doping; Electrical resistance measurement; Geometry; Immune system; Implants; Level measurement; Manuals; Physics; Semiconductor optical amplifiers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-5410-9
Type :
conf
DOI :
10.1109/IEDM.1999.823877
Filename :
823877
Link To Document :
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