DocumentCode
1639005
Title
Snapback and safe operating area of LDMOS transistors
Author
Hower, P.L. ; Merchant, Shakila
Author_Institution
Unitrode Corp., Merrimack, NH, USA
fYear
1999
Firstpage
193
Lastpage
196
Abstract
This paper deals with the measurement and prediction of the SOA boundary and the accompanying device physics. Results are given for n-channel LDMOS transistors having a self-aligned body diffusion. LDMOS SOA has been discussed previously in a number of papers, however, there is still a need for improving the overall understanding of this rather complicated subject. To be complete, thermal effects should also be included in the definition of SOA, however, these can be treated separately and we focus here on the "electrical SOA", which is defined by the Id-Vds boundary where snapback occurs.
Keywords
power MOSFET; semiconductor device manufacture; semiconductor device models; Id-Vds boundary; LDMOS transistors; SOA boundary; device physics; n-channel LDMOSFET; safe operating area; self-aligned body diffusion; snapback; thermal effects; Displays; Doping; Electrical resistance measurement; Geometry; Immune system; Implants; Level measurement; Manuals; Physics; Semiconductor optical amplifiers;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location
Washington, DC, USA
Print_ISBN
0-7803-5410-9
Type
conf
DOI
10.1109/IEDM.1999.823877
Filename
823877
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