DocumentCode :
1639217
Title :
Extension of common-emitter breakdown voltage for high speed Si/Si 1-xGex HBT´s
Author :
Shah, M. Reaz ; Maziar, C.M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
fYear :
1992
Firstpage :
42
Lastpage :
45
Abstract :
Various collector structures were simulated to identify design options which lead to an increase in the breakdown voltage of high speed SiGe-base heterojunction bipolar transistors (HBTs). The authors propose an approach for increasing the breakdown voltage by appropriately tailoring the doping profile in the collector. A two-part collector doping profile was found to reduce the avalanche multiplication ratio by more than an order of magnitude. Simulation results indicate that this improvement can be achieved without severe degradation of the base pushout effect
Keywords :
Ge-Si alloys; doping profiles; electric breakdown of solids; elemental semiconductors; heterojunction bipolar transistors; impact ionisation; semiconductor materials; silicon; HBTs; Si-SiGe; avalanche multiplication ratio; base pushout effect; collector structures; common-emitter breakdown voltage; heterojunction bipolar transistors; high speed; two-part collector doping profile; Avalanche breakdown; Breakdown voltage; Degradation; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Impact ionization; Numerical simulation; Silicon germanium; Space charge;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 1992., Proceedings of the 1992
Conference_Location :
Minneapolis, MN
Print_ISBN :
0-7803-0727-5
Type :
conf
DOI :
10.1109/BIPOL.1992.274086
Filename :
274086
Link To Document :
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