DocumentCode :
1639487
Title :
New coating materials for artificial heart valves
Author :
Bolz, A. ; Schaldach, M.
Author_Institution :
Dept. of Biomed. Eng., Friedrich-Alexander-Univ. Erlangen-Nurnberg, West Germany
fYear :
1989
Firstpage :
164
Abstract :
Amorphous hydrogenated silicon carbide films (a-SiC:H) prepared by plasma-activated chemical vapor deposition (PACVD) were experimentally evaluated. Depending on the ratio of silicon to carbon, bandgap energies up to 2.3 eV and dark conductivities between 10-9 and 10-8 (Ω cm)-1 at 37°C were obtained. Doping with phosphorus led to an increase in conductivity up to 10-3 (Ω-cm)-1. Additionally, the deposited layers showed a microhardness of 10 GPa or more, which results in a high wear resistance. These findings demonstrate that a-SiC:H films with a silicon content of about 80% do match the electronic as well as the mechanical requirements for improved hemocompatibility in contrast to carbons
Keywords :
cardiology; plasma CVD coatings; prosthetics; 37 degC; SiC:H; bandgap energy; dark conductivity; deposited layers; hemocompatibility; microhardness; plasma-activated chemical vapor deposition; Amorphous materials; Artificial heart; Coatings; Conducting materials; Conductivity; Heart valves; Plasma chemistry; Plasma materials processing; Semiconductor films; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering in Medicine and Biology Society, 1989. Images of the Twenty-First Century., Proceedings of the Annual International Conference of the IEEE Engineering in
Conference_Location :
Seattle, WA
Type :
conf
DOI :
10.1109/IEMBS.1989.95661
Filename :
95661
Link To Document :
بازگشت