• DocumentCode
    164015
  • Title

    Wide bandgap semiconductors for ultra high voltage devices. Design and characterization aspects

  • Author

    Planson, D. ; Brosselard, P. ; Isoird, K. ; Lazar, Mircea ; Phung, L.V. ; Raynaud, C. ; Tournier, D.

  • Author_Institution
    Ampere Lab., Univ. de Lyon, Villeurbanne, France
  • fYear
    2014
  • fDate
    13-15 Oct. 2014
  • Firstpage
    35
  • Lastpage
    40
  • Abstract
    The development of high voltage devices is a great challenge. At least, railway and smart grids are examples of applications requiring high voltage devices. SiC power devices and technology seem to be mature enough to give a short term solution. Indeed, silicon carbide devices appear to be the semiconductor of choice for high voltage (> 6.5 kV) applications compared to Gallium Nitride. Diamond also is considered as a promising material for the next generation power devices. For high voltage devices, periphery protection is mandatory in order to reduce the well-known electric field crowding taking place at the junction edge. Some details are given about the different periphery technics (JTE, guard rings, MESA) applied to SiC and diamond devices, before combining some of them to reach higher and higher breakdown voltages. Finally, a new setup is under development in order to extract the ionization coefficients, compulsory to predict the breakdown voltage.
  • Keywords
    diamond; electric breakdown; electric fields; ionisation; power semiconductor devices; silicon compounds; wide band gap semiconductors; JTE; MESA; SiC; breakdown voltages; characterization aspects; electric field crowding; guard rings; ionization coefficients; junction edge; periphery protection; power devices; railway; smart grids; ultra high voltage devices; wide bandgap semiconductors; Diamonds; Doping; Electric fields; Junctions; Materials; PIN photodiodes; Silicon carbide; OBIC; device characterization; device design; diamond; gallium nitride; high voltage device; silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference (CAS), 2014 International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4799-3916-9
  • Type

    conf

  • DOI
    10.1109/SMICND.2014.6966383
  • Filename
    6966383