• DocumentCode
    164084
  • Title

    Manufacturing of capacitive electrodes on Si-substrate for electrophysiological applications

  • Author

    Ravariu, C. ; Babarada, F. ; Manea, E. ; Parvulescu, C. ; Rusu, Irena ; Enache, I. ; Cristea, M. ; Arhip, J.

  • Author_Institution
    Fac. of Electron., Politeh. Univ. of Bucharest, Bucharest, Romania
  • fYear
    2014
  • fDate
    13-15 Oct. 2014
  • Firstpage
    151
  • Lastpage
    154
  • Abstract
    The usual electrodes from electrophysiology are resistive. A variable metal-skin contact resistance frequently generates unpleasant artifacts. The capacitive electrodes avoid this disadvantage and are suitable for variable biosignals recording. The main novelty of this paper is the manufacturing of capacitive electrodes with all terminals on the top surface, letting free the electrode bottom for physiological preparations. So, the paper firstly presents the TCAD techniques used for the design of some capacitive electrode using three mask levels. By EDA, L-EDIT tools, the layers that constitute the fabrication masks are transferred to the glass support. In the last part, the electrodes technological flow design and testing in a real electrophysiological platform using the capacitive electrodes, are presented.
  • Keywords
    bioelectric phenomena; biomedical electrodes; glass; metals; silicon; skin; substrates; EDA; L-EDIT tools; Si-substrate; TCAD techniques; artifacts; biosignal recording; capacitive electrode manufacturing; electrode bottom; electrode technological flow design; electrophysiological applications; electrophysiological platform; electrophysiology; fabrication masks; glass support; physiological preparations; top surface terminals; variable metal-skin contact resistance; Capacitance; Electrodes; Metals; Robot sensing systems; Silicon; Skin; Substrates; L-Edit; TiPt; capacitive electrodes; electrophysiological applications;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference (CAS), 2014 International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4799-3916-9
  • Type

    conf

  • DOI
    10.1109/SMICND.2014.6966419
  • Filename
    6966419