DocumentCode
1641505
Title
Modeling the parasitic bipolar device in the 40nm PD SOI NMOS device considering the floating body effect
Author
Chen, C.H. ; Kuo, J.B. ; Chen, D. ; Yeh, C.S.
Author_Institution
Dept. of Electr. Eng, Nat. Taiwan Univ., Taipei, Taiwan
fYear
2010
Firstpage
1946
Lastpage
1948
Abstract
This paper reports modeling the parasitic bipolar device in the 40 nm PD SOI NMOS device considering the floating body effect. Using a unique extraction method, the function of the parasitic bipolar device during transient operations could be modeled. During the turn-on transient by imposing a step voltage from 0 V to 2 V at the gate, the case with a slower rise time shows a faster turn-on in the drain current due to a stronger function of the parasitic bipolar device from smaller displacement currents through the gate oxide, as reflected in the current gain, as verified by the experimentally measured results.
Keywords
MOS integrated circuits; silicon-on-insulator; floating body effect; gate oxide; parasitic bipolar device modeling; size 40 nm; turn-on transient; unique extraction method; voltage 0 V to 2 V; Current measurement; Impact ionization; Logic gates; MOS devices; Semiconductor device modeling; Transient analysis; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667810
Filename
5667810
Link To Document