• DocumentCode
    1641505
  • Title

    Modeling the parasitic bipolar device in the 40nm PD SOI NMOS device considering the floating body effect

  • Author

    Chen, C.H. ; Kuo, J.B. ; Chen, D. ; Yeh, C.S.

  • Author_Institution
    Dept. of Electr. Eng, Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2010
  • Firstpage
    1946
  • Lastpage
    1948
  • Abstract
    This paper reports modeling the parasitic bipolar device in the 40 nm PD SOI NMOS device considering the floating body effect. Using a unique extraction method, the function of the parasitic bipolar device during transient operations could be modeled. During the turn-on transient by imposing a step voltage from 0 V to 2 V at the gate, the case with a slower rise time shows a faster turn-on in the drain current due to a stronger function of the parasitic bipolar device from smaller displacement currents through the gate oxide, as reflected in the current gain, as verified by the experimentally measured results.
  • Keywords
    MOS integrated circuits; silicon-on-insulator; floating body effect; gate oxide; parasitic bipolar device modeling; size 40 nm; turn-on transient; unique extraction method; voltage 0 V to 2 V; Current measurement; Impact ionization; Logic gates; MOS devices; Semiconductor device modeling; Transient analysis; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667810
  • Filename
    5667810